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Photomasks play an important role in the semiconductor manufacturing process and are the master plates used to transfer circuits onto semiconductor wafers. Based on circuit data, an electron beam is used to create an electronic circuit pattern on a photomask substrate (mask blank), which is then etched with chemicals, stripped of photoresist (photosensitive material), cleaned, measured, and inspected before the photomask is completed.

Nanoimprinting is a microfabrication technology that transfers patterns at the tens of nanometer level by pressing a mold, which serves as an original plate. Because of the simplicity of the process, nanoimprinting is expected to be a technology for mass production of microstructures at low cost and with good reproducibility.

Toppan Photomask is providing high resolution, highly reliable photomasks not only for semiconductors, but also for different industrial areas / research purposes, utilizing its microfabrication technology.

Silicon stencil mask is a photomask for Electron Beam Lithography, with nanometer size apertures to fabricate nanometer scale patterns.

EB Lithography has been extensively studied in the Semiconductor industry as a technology to manufacture an advanced photomask.

Toppan Photomask has been developing stencil masks as a core technology of microfabrication and establishing a supply system.